Scientist of X-Ray Photoelectron Spectroscopy: The Helmholtz-Zentrum Berlin (HZB) is seeking a highly motivated Scientist to join the Institute IFOX. This position offers the opportunity to investigate the growth of oxide heterostructures on semiconductors using advanced in-system X-ray photoelectron spectroscopy during molecular beam epitaxy (MBE). The successful candidate will work within the framework of the ERC Advanced Grant LUCIOLE, contributing to energy-efficient information technology and neuromorphic computing applications.
Designation
Scientist (f/m/d) of Advanced In-System X-Ray Photoelectron Spectroscopy
Location
Helmholtz-Zentrum Berlin (HZB)
Research Area
Functional oxide thin films and nanostructures combined with semiconductors for energy-efficient information technology.
Eligibility/Qualification
- Completed PhD in Physics, Chemistry or Materials Science.
- Extended experience in X-ray photoelectron spectroscopy (at least 2 years).
- Experience in the field of oxide thin films.
- Experience in the field of ferroelectrics is a plus.
Job Description
- X-ray photoelectron spectroscopy characterization of oxide heterostructures on semiconductors.
- Conduct in-system XPS investigations during MBE growth for interface and material engineering.
- Perform synchrotron experiments including HAXPES, PEEM, and XRD.
- Supervise Master and/or PhD students.
- Present findings at international conferences and publish experimental results.
How to Apply
To apply, please prepare the following documents:
- Letter of application explaining how you meet the requirements.
- Curriculum Vitae.
- List of publications.
- Copies of diploma and grades with English translation.
- Names of two potential reviewers.
Applications must be submitted via our application management system.
Last Date to Apply
28th March 2025
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