PhD Position in Ultrathin Ferroelectric: A funded PhD project is available focused on ultrathin ferroelectric Hf₁₋ₓZrₓO₂ (HZO) films for integration with 2D semiconductor devices. This research aims to explore advanced materials for next-generation memory and sensing applications.
PhD Position in Ultrathin Ferroelectric Hf₁₋ₓZrₓO₂ Films
Designation
PhD Candidate
| Research Area | Location |
|---|---|
| Ultrathin Ferroelectric Films | Madrid, Spain |
Eligibility/Qualification
- Master’s degree in Physics, Materials Science, Nanoscience, or a related field.
- Must not hold a PhD or have previously held a contract under the Spanish FPI or equivalent national research training programs.
- Must have (or be in the process of obtaining) legal residence in Spain.
- Must be admitted to a doctoral program before signing the contract.
- Strong motivation and interest in experimental research.
Description
The PhD project involves low-temperature synthesis, strain engineering, and nanofabrication of free-standing HZO structures. The work will be co-supervised by Íñigo Bretos and Andrés Castellanos-Gomez and is funded through the competitive FPI (PIX2024) program at the Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC).
Conditions
- Full-time PhD contract (up to 4 years).
- Gross salary: ~1,515 €/month (year 1) up to ~2,029 €/month (years 3–4).
- ~6,800 € for PhD tuition and international research stays.
- Planned start date: As soon as possible — strict deadlines apply.
How to Apply
Interested candidates should send their CV and motivation letter immediately to:
Andres Castellanos-Gomez
Email: andres.castellanos@csic.es
Last Date to Apply
Applications should be submitted as soon as possible.
Institution Contact Information
ICMM-CSIC
Sor Juana Ines de la Cruz, 3
Cantoblanco, 28049 Madrid, España
Telephone: (+34) 91 334 90 00
Email: info@icmm.csic.es
Communication Office: comunicacion@icmm.csic.es
