PhD Position in Ultrathin Ferroelectric Films: The Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC) is offering a fully funded PhD position focused on ultrathin ferroelectric Hf₁₋ₓZrₓO₂ (HZO) films for integration with 2D semiconductor devices. This research will explore low-temperature synthesis, strain engineering, and nanofabrication of free-standing HZO structures, targeting advanced memory and sensing applications.
PhD Position in Ultrathin Ferroelectric Hf₁₋ₓZrₓO₂ (HZO) Films
Designation
PhD Position (FPI-CSIC)
| Research Area | Location |
|---|---|
| Ultrathin Ferroelectric Hf₁₋ₓZrₓO₂ Films | Madrid, Spain |
Eligibility/Qualification
- Master’s degree in Physics, Materials Science, Nanoscience, or a similar field.
- Must not hold a PhD.
- Must not have previously held a contract under the Spanish FPI or equivalent national research training programs.
- Must have (or be in process of obtaining) legal residence in Spain.
- Must be admitted to a doctoral program before signing the contract.
- Strong motivation and interest in experimental research.
Description
The selected candidate will engage in pioneering research involving:
- Low-temperature synthesis of HZO films.
- Strain engineering and nanofabrication of free-standing structures.
- Development applications in next-gen memory and sensing technologies.
Contract Conditions:
- Full-time PhD contract (up to 4 years).
- Gross salary:
- Year 1: ~1,515 €/month
- Years 3-4: ~2,029 €/month
- ~6,800 € provided for PhD tuition and international research stays.
- Planned start: as soon as possible with strict deadlines.
How to Apply
Interested candidates should send their CV and a motivation letter immediately to:
Andrés Castellanos-Gomez
Email: andres.castellanos@csic.es
Last Date to Apply
Apply as soon as possible.
For further inquiries, please contact:
Telephone: (+34) 91 334 90 00
Email: info@icmm.csic.es
This scholarship offers a unique opportunity to contribute significantly to a cutting-edge area of research in materials science and nanotechnology. Don’t miss the chance to advance your academic career!
