Postdoc: Tribochemical Nanolithography: Are you interested in simultaneously unraveling the fundamentals of wear and contributing to the solution of friction-related challenges in computer chip production? Join us at the Advanced Research Center for Nanolithography (ARCNL) to work on new processes to fabricate the electronic chips that power nearly every sector in the world.
Postdoc: Tribochemical Wear with Relevance to Nanolithography
Designation: Postdoctoral Researcher
Research Area: Tribochemical Wear in Nanolithography
Location: Amsterdam Science Park, The Netherlands
Eligibility/Qualification:
- PhD degree in physics or a related subject.
- Enjoy performing experiments and analysis to build a deeper understanding of complex physical mechanisms.
- Effective communication skills to explain research results.
- Experience in using/developing instrumentation for mechanical/tribological testing is preferred.
Job Description: In this project, you will perform wear experiments on a recently developed instrument that enables customized wear experiments in a controllable environment. The goal is to provide insight into industrially relevant wear behavior, leading to control over the wear behavior and its impact on positioning accuracy in nanolithography.
You will be embedded in the Contact Dynamics team at ARCNL, investigating friction and wear in relation to positioning challenges in the semiconductor industry. This involves working with world-wide unique wear setups and collaborating with both academic and industrial partners.
How to Apply: You can respond to this vacancy online via the button below. Please send your:
- Resume
- Motivation on why you want to join the group to work on this topic specifically (max. 1 page).
Applications without this motivation will not be taken into account. However, with this motivation, your application will receive our full attention.
Last Date for Apply: Until position filled
Contact Information: For more information, please contact:
Dr. Bart Weber
Group Leader Contact Dynamics
E-mail: b.weber@arcnl.nl
Phone: +31 20 8517100
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (RuG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has approximately 100 scientists and support staff. For more details, visit www.arcnl.nl.
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