Summary:
The Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden) is offering a PhD position in the Institute for Materials Chemistry, working in the Nanostructured Thin Film Materials group. The project focuses on developing area-selective atomic layer deposition (ASD) processes for next-generation semiconductors, including fabrication and characterization of metal and oxide thin films for memristor devices. The position is part-time (67% FTE) and starts on 01.08.2026.
PhD Scholarship – Area-Selective Atomic Layer Deposition for Next-Generation Semiconductors, Germany
Designation: PhD Researcher (m/f/div)
Research Area: Area-Selective Atomic Layer Deposition (ASD), Thin-Film Materials, Surface Chemistry, Semiconductor Device Engineering
Location: Dresden, Germany (IFW Dresden, Institute for Materials Chemistry)
Eligibility / Qualification:
- Master’s degree (M.Sc.) in Materials Science, Chemistry, Physics, or related field
- Knowledge of thin-film fabrication techniques, particularly ALD, CVD, or related methods
- Experience in surface chemistry, nanomaterials, and thin-film characterization is advantageous
- Strong communication skills in English and ability to work collaboratively in an international research environment
Job Description:
| Aspect | Details |
|---|---|
| Project Focus | Development of ALD/ASD processes for next-generation semiconductors, including selective deposition of functional metal and oxide thin films. |
| Experimental Work | Optimization of surface chemistry, inhibitors, and growth conditions for selective deposition; characterization of films using XPS, SEM, AFM, XRD, Raman, ellipsometry, electrical measurements. |
| Techniques | Thin-film fabrication (ALD, CVD), surface chemistry analysis, nanomaterials characterization, structure–property relationship studies. |
| Employment Type | Part-time (26.8 hours/week, 67% FTE), fixed-term 12 months, extendable for 24 months. |
| Benefits | Modern TU Dresden campus workplace, flexible and family-friendly hours, 30 days vacation, pension scheme (VBL), job/Germany ticket benefits, annual special payment, capital-forming benefits, health management, discounted sports offers, training & language courses, company restaurant, international collaboration. |
| Salary | According to TV-L EG 13 (German public service collective bargaining law). |
How to Apply:
Submit a single PDF (other formats not accepted) including:
- CV and list of publications
- Motivation letter describing research goals, skills, and experience
- Copies of certificates
- Contact details of at least two professional references
Include reference number: 038-26-3500 and send to: bewerbung@ifw-dresden.de
For inquiries, contact:
- Prof. Dr. Anjana Devi – office-imc@ifw-dresden.de
- Dr. Harish Parala – office-imc@ifw-dresden.de
Last Date for Apply: 31 May 2026
Notes:
- IFW Dresden encourages applications from women and individuals with severe disabilities. Proof of status must be included.
- IFW Dresden promotes diversity, international collaboration, and work-life balance.
