Summary:
The Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden) invites applications for a PhD position in the Institute for Materials Chemistry, working in the Nanostructured Thin Film Materials group. The project focuses on developing area-selective atomic layer deposition (ASD) processes for next-generation semiconductors, including fabrication and characterization of functional metal and oxide thin films. The position starts on 01.08.2026 and offers an interdisciplinary research environment at the forefront of thin-film technology.
PhD Scholarship – Area-Selective Atomic Layer Deposition for Next-Generation Semiconductors, Germany
Designation: PhD Researcher (m/f/div)
Research Area: Area-Selective Atomic Layer Deposition (ASD), Thin-Film Materials, Surface Chemistry, Semiconductor Device Engineering
Location: Dresden, Germany (IFW Dresden, Institute for Materials Chemistry)
Eligibility / Qualification:
- Master’s degree (M.Sc.) in Materials Science, Chemistry, Physics, or related field.
- Knowledge of thin-film fabrication techniques (ALD, CVD, or related methods).
- Experience in surface chemistry, nanomaterials, and thin-film characterization is advantageous.
- Strong English communication skills and ability to work collaboratively in an international research environment.
Job Description:
| Aspect | Details |
|---|---|
| Project Focus | Development of ALD/ASD processes for next-generation semiconductors, including selective deposition of metal and oxide thin films. |
| Experimental Work | Fabrication and optimization of thin films; surface chemistry studies; nucleation mechanisms; structure–property relationship analysis for memristor devices. |
| Techniques | XPS, SEM, AFM, XRD, Raman, ellipsometry, electrical measurements, and other analytical methods. |
| Employment Type | Part-time (26.8 hours/week, 67% FTE), initially 12 months, extendable for 24 months. |
| Benefits | Modern TU Dresden campus workplace, flexible and family-friendly hours, 30 days vacation, pension scheme (VBL), job/Germany ticket benefits, annual special payment, capital-forming benefits, health management, discounted sports offers, training and language courses, company restaurant. |
| Salary | According to TV-L EG 13 (German public service collective bargaining law). |
How to Apply:
Submit a single PDF (other formats not accepted) including:
- CV and list of publications
- Motivation letter outlining research goals, skills, and experience
- Copies of certificates
- Contact details of at least two professional references
Include reference number: 038-26-3500 and send to: bewerbung@ifw-dresden.de
For inquiries, contact:
- Prof. Dr. Anjana Devi – office-imc@ifw-dresden.de
- Dr. Harish Parala – office-imc@ifw-dresden.de
Last Date for Apply: 31 May 2026
Notes:
- IFW Dresden encourages applications from women and individuals with severe disabilities. Relevant proof must be attached.
- IFW Dresden promotes diversity, international collaboration, and work-life balance.
