Summary
Aalto University invites applications for a postdoctoral researcher position specializing in Atomic Layer Deposition (ALD) within the Soft Matter and Wetting Group, focusing on innovative thin film technologies for advanced medical technologies.
Postdoctoral Researcher in Atomic Layer Deposition (ALD), Otaniemi, Espoo, Finland
Designation
Postdoctoral Researcher
| Details | Information |
|---|---|
| Research Area | Atomic Layer Deposition (ALD) |
| Location | Otaniemi, Espoo, Finland |
| Eligibility/Qualification | PhD in physics, chemistry, materials science; experience in ALD and surface characterization is preferred. |
| Salary | Approximately 4130–4550 €/month |
| Duration | Initial funding for one year with the possibility of extension. |
Description
The successful candidate will contribute to the design, fabrication, and testing of functional thin film coatings. Key responsibilities include:
- Developing and optimizing advanced surfaces using state-of-the-art thin film technologies.
- Characterizing thin films with techniques such as scanning electron microscopy.
- Analyzing results and planning future work accordingly.
- Collaborating with team members and contributing to the maintenance of ALD tools.
How to Apply
Interested candidates should submit their application, including:
- A letter of motivation
- A CV with a list of publications
- Contact details for at least two referees.
Applications must be submitted as a single PDF document in English through Aalto University’s online recruitment system.
Last Date for Apply
April 12, 2026
For further details, candidates can contact Prof. Robin Ras at robin.ras@aalto.fi. Don’t miss this opportunity to join a leading research team and contribute to cutting-edge medical technologies at Aalto University!
